Centerline uses both mechanical and chemical mechanical process (CMP) to meet the polishing needs of our customers. |
Centerline Technologies is dedicated to providing the polishing of advanced materials to surface finishes and supplier quality levels that consistently meet or exceed our customer’s expectations.
Advanced level polishing requires that appropriate abrasive and pre-lapping conditions be used to significantly reduce sub-surface damage. Centerline uses both mechanical and CMP (chemical mechanical process) depending on the customers requirements. We are constantly looking for ways to enhance the processes that we have already established, while maintaining careful process controls and qualifications.
Industry standard materials polished are 99.6% Alumina, 96% Alumina, AlN, BeO, Sapphire, Fused Silica. Centerline polishes virtually any ferrous or non ferrous material.
Centerline Technologies’ polishing process controls the surface finish and, combined with our lapping process, assures thickness identity and parallelism, as well as flatness of substrates. Our lapping and polishing processes are custom designed for each type of material and the physical dimensions required.
Material
|
Surface Finish
|
Thickness Tolerance
|
Applications
|
< 4 u-in
|
+/- 10% or +/- 5% |
Use for low to medium power DC & RF circuits | |
< 1 u-in
|
+/- .0005" | Use for low to medium power RF, Microwave, and Optical interconnects | |
< 3 u-in
|
+/- .0005" | Use for high power DC/RF/Microwave & Optical applications | |
< 2 u-in
|
+/- .0005" | Use for higher power DC/RF/Microwave & Optical applications | |
< 1 u-in
|
+/- .0005" | Use for Optical or High Frequency interconnects requiring extremely low loss transmission performance | |
Polished Titanates
|
< 3 u-in
|
+/- .0005" | RF & Microwave devices requiring high Q performance |
Centerline
Technologies, LLC
577 Main Street
Suite 270
Hudson, MA 01749
Call: 978-568-1330
Fax: 978-568-1334